Basic principle: A patterned photoresist is placed in intimate contact with a planar surface. A droplet of liquid is placed in contact with the photoresist, and the drop spontaneously imbibes itself throughout the capillary channels to wet the underlying surface. The liquid leaves behind patterned features identical to the resist pattern. The features are of variable height, defined by the thickness of the photoresist.
Advantages:
- high resolution printing
- versatile and suitable for a range of materials
- good reproducibility and batch to batch uniformity
- low cost and simple fabrication process
Applications:
- organic field effect transistors
- organic light-emitting diodes
- metal nanowires
- quantum dots